I-Silica eFused (JGS1, 2, 3)
I-silica edibeneyo (i-FS) yinto esetyenziswa ngokubanzi kunye nokucoceka kweekhemikhali eziphezulu, iimpawu ezintle zokwandiswa kwe-thermal, isalathisi esisezantsi se-refraction kunye ne-homogeneity egqwesileyo. Isici esihle kakhulu sokwandiswa kwe-thermal luphawu olubalaseleyo lwesilica edityanisiweyo.Xa ithelekiswa ne-N-BK7, i-silica edityanisiweyo ye-UV iyabonakala kuluhlu olubanzi lwamaza obude (185 nm - 2.1 µm). Iyakwazi ukumelana nemikrwelo kwaye ibonisa ubuncinci be-fluorescence xa iboniswe kumaza amaza angaphezulu kwama-290 nm. I-silica edibeneyo ibandakanya ibakala le-UV kunye nebakala le-IR.
Iimpahla zeMathiriyeli
Isalathiso seRefractive se (nd)
1.4586
Inombolo ka-Abbe (Vd)
67.82
Isalathiso esiqhelekileyo seHomogeneity
< 8 x 10-6
I-Thermal Expansion Coefficient (CTE)
0.58 x 10-6/K (0℃ ukuya ku-200℃)
Ukuxinana
2.201 g/cm3
Imimandla yoThutho kunye nezicelo
| Eyona Range yoThutho | Izicelo ezifanelekileyo |
| 185 nm - 2.1 μm | Isetyenziswe kwi-interferometry, i-laser instrumentation, i-spectroscopy kwi-UV kunye ne-IR spectrum |
Igrafu
Igrafu ekunene ligophe lothumelo lwe-10mm elishinyeneyo elingagqunywanga i-UV edibeneyo ye-silica substrate
Asigqibekanga ukusebenzisa izinto ezilinganayo zaseTshayina zesilica edibeneyo, kukho iintlobo ezintathu ze-silica edibeneyo e-China: i-JGS1, i-JGS2, i-JGS3, isetyenziselwa usetyenziso olwahlukileyo. Nceda ujonge ezi propati zilandelayo zineenkcukacha ngokulandelelanayo.
I-JGS1 isetyenziswa ikakhulu kwi-Optics kwi-UV kunye noluhlu lwamaza olubonakalayo. Ayinamaqamza kunye nokubandakanywa. Ilingana neSuprasil 1&2 kunye neCorning 7980.
I-JGS2 isetyenziswa kakhulu njenge-substrate yezibuko okanye izibonisi, njengoko inamaqamza amancinci ngaphakathi. Ilingana neHomosil 1, 2 & 3.
I-JGS3 ibonakala kwi-ultraviolet, imimandla ebonakalayo kunye ne-infrared spectral, kodwa inamaqamza amaninzi ngaphakathi. Ilingana neSuprasil 300.
Iimpahla zeMathiriyeli
Isalathiso seRefractive se (nd)
1.4586 @588 nm
Abbe Constant
67.6
I-Thermal Expansion Coefficient (CTE)
5.5 x 10-7cm/cm. ℃ (20℃ ukuya ku-320℃)
Ukuxinana
2.20 g/cm3
Ukuzinza kweMichiza (ngaphandle kwe-hydrofluoric)
Ukuxhathisa okuPhezulu kuManzi kunye ne-Acid
Imimandla yoThutho kunye nezicelo
| Eyona Range yoThutho | Izicelo ezifanelekileyo |
| JGS1: 170 nm - 2.1 μm | I-Laser substrate: iifestile, iilensi, iiprism, izibuko, njl. |
| JGS2: 260 nm - 2.1 μm | I-Mirrors substrate, i-Semiconductor kunye nefestile yobushushu obuphezulu |
| JGS2: 185 nm - 3.5 μm | I-Substrate kwi-UV kunye ne-IR spectrum |
Igrafu
I-Curve yoThutho lwe-Uncoated JGS1 (UV Grade Fused Silica) Substrate
Igophe loThutho lwe-JGS2 eNgagqunywanga (i-Silica eFused for izipili okanye iReflectors) Substrate
I-Curve yoThumelo lwe-Uncoated JGS3 (i-IR Grade Fused Silica) Substrate
Ngolwazi olunzulu oluthe kratya lwedatha, nceda ujonge ikhathalogu yethu ye-optics ukubona ukhetho lwethu olupheleleyo lwe-optics eyenziwe kwi-JGS1, JGS2, kunye ne-JGS3.
